Our research group aims to understand and predict how devices work, by research based on modelling materials at the atomic scale. We supply fundamental insights into how materials perform in various technologies, ranging from electronics to solar power, and so work closely with experimental groups in academia and industry. There is particular focus on modelling atomic layer deposition (ALD) and heterogeneous catalysis at surfaces.
Atomic layer deposition (ALD) of alumina, hafnia/zirconia | Thin film dielectrics for transistors, capacitors and memory | ELECTRONICS | ||
Oxide-oxide heterojunctions on titania | Photocatalysis for renewable energy | ENERGY | ||
Chemistries for depositing copper metal and surfaces during growth | 3D nanoelectronic interconnects | ELECTRONICS | ||
Surfaces of ceria | Heterogeneous catalysis | ENERGY | ||
Native oxides of III-V semiconductors | Interfaces in CMOS transistors | ELECTRONICS | ||
Multi-scale modelling of oxide growth | Thin film dielectrics for transistors, capacitors and memory | MATERIALS | ||
ALD of silicon nitride, silicon carbide and silicon oxide | Etch-resistant layers for fabricating electronic devices | ELECTRONICS | ||
Transparent conductive oxides | Solar cells and smart windows | ENERGY |
We have bilateral projects including industry funding with:
Johnson Matthey
Intel Ireland
Applied Materials
Henkel Ireland
Lam Research
In addition, we are involved in multi-lateral projects and have published joint papers with other companies.
We have joint papers or bilateral projects with:
TU Eindhoven, Netherlands
MDM National Laboratory, Italy
University of Liverpool, UK
University of Reading, UK
Strathclyde University, UK
University of Barcelona, Spain
Kinki University, Japan
Freidrich-Alexander University Erlangen-Nuremberg, Germany
University of Osnabruck, Germany
CSIC Madrid, Spain
Carleton University, Canada
CIC Nanogune, Spain
as well as multi-lateral projects with other research groups world-wide.