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Photonics
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III-V & III-Nitride Materials
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CAPPA
III-V & III-Nitride materials
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III-V Materials & Devices
Centre for Advanced Photonics & Process Analysis (CAPPA)
III-Nitride Materials
Epitaxy & Physics of Nanostructures
Integrated Photonics
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Photonic Systems Group
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Atomic Layer Deposition
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Anti-Microbial Surfaces
Modelling Atomic Layer Deposition
Mechanism of Alumina ALD
Clean-up of III-V Oxides
Multi-scale Simulation
Hafnia and Zirconia Precursors
Interfaces with Oxides
ALD of Silicon-Based Materials
Deposition of Copper Metal
Materials Modelling for Catalysis & Transparent Electrodes
Modified TiO2 Photocatalysts
Doped Ceria for Catalysis
Photocatalysis
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ICT 4 Energy
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Margaret Hegarty - Process Engineer
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+353 (0)21 2346170
margaret.hegarty (at) tyndall (dot) ie
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